The AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2020 Workshop (ALE 2020), so that attendees can interact freely. The conference will take place Sunday, June 28-Wednesday, July 1, 2020, at the International Convention Center in Ghent, Belgium.
As in past conferences, the meeting will be preceded (Sunday, June 28) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, June 29-July 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.
ALD Program Chairs
Christophe Detavernier (Ghent University, Belgium)
Jolien Dendooven (Ghent University, Belgium)
Paul Poodt (TNO/Holst Center, The Netherlands)
ALE Program Chairs
Erwin Kessels (Eindhoven University of Technology, The Netherlands)
Harm Knoops (Oxford Instruments, The Netherlands)
Jean-Francois de Marneffe (imec, Belgium)