Schedule

Virtual Meeting Schedule

The AVS 20th International Conference on Atomic Layer Deposition (ALD 2020) featuring the 7th International Atomic Layer Etching Workshop (ALE 2020) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions. The pre-registration deadline is June 25, 2020.

The ALD/ALE 2020 Virtual Meeting will kick off on Monday, June 29, 2020, with a FREE (registration required) live Plenary & ALD Innovator Award Session. Following the announcement of the ALD 2020 Awardee there will be a series of plenary and invited talks.

Paid attendees will be able to participate in the Tuesday, June 30, 2020 and Wednesday, July 1, 2020, Technical & Poster Sessions. The live sessions will feature invited and student awards talks. After each day’s live sessions, we also invite attendees to view the pre-recorded Technical & Poster Sessions On Demand. Posters will be a mix of pre-recorded (video or audio) talks and/or PDF files.

Attendees may also register for the Tutorial that is being held live over a two-day period (Tuesday, June 30-Wednesday, July 1). The Tutorial will feature three speakers each day with a live question and answer period where your chat questions can be answered. The Tutorial Session will be recorded and placed On Demand for those who paid for them until July 31, 2020.

Online Scheduler or

Mobile App

Live Daily Session with Plenary and Invited Speakers with Q&A Chat
Live Announcement of the AVS ALD Innovator & JVST Best Paper Award
Live Two-Day Tutorial with Academic and Industry Experts with Q&A Chat
Live Student Awards Presentations with Q&A Chat and an Awards Presentation
Live Virtual Sponsor Rooms
On Demand Poster Sessions with a Mix of Pre-recorded (Video or Audio) Talks and/or PDF files
On Demand Sessions Available Through July 2021

Time Zone:
All Live sessions will be held in Eastern Daylight Time (EDT). Please note that Live sessions will also be recorded and added to the On Demand sessions. Time Zone Converter Tool

Access and Viewing Platform:
All sessions will be accessible via the ALD/ALE 2020 Online Scheduler and/or Mobile App until July 31, 2020*. Live sessions will be presented over the conference dates (June 29-July 1, 2020). On Demand access will begin on Monday, June 29, 2020.

*Access After July 31, 2020: AVS Platinum Members will have access to all On Demand Sessions (except the Tutorial) in the AVS Technical Library until their membership expiration date. Non-Members will also receive access to all On Demand Sessions as AVS Silver Members until July 31, 2021.

Viewing Guidelines

Presentation Guidelines

Monday, June 29

Tuesday, June 30

Wednesday, July 1

Monday, June 29

Technical & Poster Session Schedule

10:00 a.m.	Plenary & ALD Innovator Award Session Welcome and Introduction
10:15 a.m.	Meet the ALD 2020 Innovator Awardee, *Mikko Ritala* (University of Helsinki, Finland)
10:30 a.m.	Selective and Atomic Scale Processes to Enable Future Nano-Electronics, Robert Clark (TEL Technology Center‚ America‚ LLC)
11:00 a.m.	The First Application of ALD Technology in Display Industry, *Hyun-Chul Choi* (LG Display, South Korea)
11:15 a.m.	Break
11:30 am.	ALD on Powders for Catalysis, Frank Rosowski (BASF SE‚ Germany)
12:00 p.m.	The Flip Side of the Story: Atomic Layer Etching, *Keren Kanarik* (Lam Research, USA)
12:30 p.m.	JVST Best Paper Award, Closing Remarks, and Sponsor Thank You (Sponsor Slide with Platinum Shout Outs)
12:45 p.m.	Session Over – View On Demand Presentations

Tuesday, June 30

Technical & Poster Session Schedule

10:00 a.m.	Welcome and Introduction
10:15 a.m.	Invited: Thermal Atomic Layer Deposition of Noble Metal Films Using Non-Oxidative Coreactants, Charles Winter (Wayne State University, USA)
10:45 a.m.	ALD Student Finalist Awardee: Mixing It Up: Tuning Atomic Ordering in 2-D Mo_1-xW_xS₂Alloys, *Jeff Schulpen*‚ Erwin Kessels‚ Vincent Vandalon‚ Ageeth Bol (Eindhoven University of Technology‚ Netherlands)
11:00 a.m.	ALD Student Finalist Awardee: Deposition of Conductive PEDOT Thin Films with EDOT and ReCl₅ Precursors, *Saba Ghafourisaleh*‚ Georgi Popov‚ Markku Leskelä‚ Matti Putkonen‚ Mikko Ritala (University of Helsinki‚ Finland)
11:15 a.m.	Break
11:30 a.m.	ALD Student Finalist Awardee: Resistless Lithography Based on Local Surface Modification of Halogenated Amorphous Carbon, Mikhail Krishtab (KU Leuven/Imec‚ Belgium); Tero Kulmala‚ Emine Cagin (Heidelberg Instruments Nano‚ Switzerland); Silvia Armini (Imec‚ Belgium); Stefan De Gendt (KU Leuven/Imec‚ Belgium); Rob Ameloot (KU Leuven‚ Belgium)
11:45 a.m.	ALD Student Finalist Awardee: Mimicking Chitin and Chitosan Type of Functionality with Novel Thin Films Grown by Molecular Layer Deposition, *Karina Ashurbekova*‚ Mato Knez (CIC nanoGUNE BRTA‚ Spain)
12:00 p.m.	Closing Remarks and Sponsor Thank You
12:15 p.m.	Session Over – View On Demand Presentations

Tutorial Session Schedule

1:00 p.m.	Tutorial Welcome and Sponsor Thank You
1:15 p.m.	Tutorial: ALD Precursor Chemistry: Synthetic Routes, Purification and Evaluation of Precursors, *Anjana Devi* (Ruhr-Universität Bochum, Germany) View Abstract
2:00 p.m.	Break
2:15 p.m.	Tutorial: Atomic Layer Engineering: Hardware Considerations for ALD System Design and Process Development, *Neil Dasgupta* (University of Michigan, USA) View Abstract
3:00 p.m.	Break
3:15 p.m.	Tutorial: ALD on High Aspect Ratio and Nanostructured Materials: from Fundamentals to Economics, *Angel Yanguas-Gil* (Argonne National Laboratory, USA) View Abstract
4:00 p.m.	Question and Answer
4:30 p.m.	Session Over – View On Demand Presentations

Wednesday, July 1

Technical & Poster Session Schedule

10:00 a.m.	Welcome and Introduction
10:15 a.m.	Invited: Surface Reactions Between Metals and Diketone induced by Gas Cluster Ion Bombardments, Noriaki Toyoda, Kota Uematsu (University of Hyogo‚ Japan)
10:45 a.m.	ALE Student Award: TBD
11:00 a.m.	Break
11:15 a.m.	Invited: Monolayer Lithography: Exploiting Inhibition Contrast from the Extreme Ultraviolet Irradiation of Organic Monolayers for Area Selective Depositions, *Rudy Wojtecki* (IBM Research – Almaden)
11:45 a.m.	Highlighted: Super-Conformal ALD of Metallic Mo Films by Simultaneous Deposition and Etch, *Jean-Sebastien Lehn* (EMD Performance Materials); Charles Dezelah (ASM‚ Finland); Jacob Woodruff‚ Ravindra Kanjolia‚ Daniel Moser‚ Thomas Polson (EMD Performance Materials)
12:00 p.m.	Break
12:15 p.m.	Highlighted: Process Optimization in Atomic Layer Deposition Using Machine Learning, Angel Yanguas-Gil‚ Steven Letourneau‚ Anil Mane‚ Noah Paulson‚ Alec Lancaster‚ *Jeffrey W. Elam* (Argonne National Laboratory)
12:30 p.m.	ALD/ALE Student Awards, Closing Remarks, and Sponsor Thank You
12:45 p.m.	Session Over – View On Demand Presentations

Tutorial Session Schedule

1:00 p.m.	Tutorial Welcome and Sponsor Thank You
1:15 p.m.	Tutorial: Growth Mechanisms and Selectivity During Atomic Layer Deposition, *Annelies Delabie* (imec, Belgium) View Abstract
2:00 p.m.	Break
2:15 p.m.	Tutorial: Self-Limiting Surface Reactions for Atomic-Level Control of Materials Processing, *Simon Elliott* (Schrödinger, Ireland) View Abstract
3:00 p.m.	Break
3:15 p.m.	Tutorial: Fundamentals of ALE – Optimizing Passivation and Etch, *Mark Kushner* (University of Michigan, USA) View Abstract
4:00 p.m.	Question & Answer
4:30 p.m.	Session Over – View On Demand Presentations

Online Scheduler or

Mobile App

ALD Invited Speakers

ALE Invited Speakers

ALD Invited Speakers

Julien Bachmann (University of Erlangen, Germany), “ALD from Dissolved Precursors: Same Principles, Original Materials”
Chunmei Ban (University of Colorado, USA), “Molecular Layer Deposition for Stabilization of Electrochemical Materials”
Robert Clark (Tokyo Electron, USA), “Selective and Atomic Scale Processes to Enable Future Nano-Electronics”
Keith Gregorczyk (University of Maryland, USA), “Conformal Ion Conductors as Enablers for 3D Solid State Energy Storage Systems”
Bram Hoex (UNSW Photovoltaic & Renewable Energy Engineering, Australia), “ALD Enabling High-Efficiency Solar Cells”
Andrew Kummel (University of California, San Diego, USA), “Deposition of High Thermal Conductivity AlN Heat Spreader Films”
Mark Losego (Georgia Tech, USA), “Vapor Phase Infiltration for Transforming Polymers into Organic Inorganic Hybrid Materials: Process Thermodynamics and Kinetics”
Catherine Marichy (University Lyon, France), “ALD of BN for Membrane Application in Water Treatment”
Miika Mattinen (Uhelsinki, Finland), “Exploring ALD 2D Chalcogenides Beyond MoS2”
Toshihide Nabatame (National Institute for Materials Science, Japan), “Study of ALD HfO2-Based High-k for GaN Power Devices and Ferroelectric Devices”
Viljami Pore (ASM Microchemistry Oy, Finland), “Thermal and Plasma ALD Processes of Silicon Based Dielectric Thin Films”
Mårten Rooth (Nanexa AB, Uppsala, Sweden), “Using an ALD Formulation to Produce Pharmaceutical Clinical Trial Material Aimed as an Injectable Depot “
Nathanaelle Schneider (CNRS, France), “Tuning Properties of ALD Oxide and Sulfide Materials for Photovoltaic Applications”
Mahdi Shirazi (Eindhoven, The Netherlands), “Atomistic Simulation of 2D-TMDs Growth by ALD”
Henrik Soensteby (University of Oslo, Norway), “Low-temperature Epitaxy of Complex Oxides”
Myung Mo Sung (Hanyang University, South Korea), “Complementary Organic-Inorganic Hybrid Superlattices”
Adriana Szeghalmi (Jena, Germany), “Highly Efficient Antireflection Coatings on Strongly Curved Substrates”
Charles Winter (Wayne State University, USA), “Thermal Atomic Layer Deposition of Noble Metal Films Using Non-Oxidative Coreactants”
Rudy Wojtecki (IBM, USA), “Monolayer Lithography – Exploiting a Contrast in Inhibition from the Photoirradiation of Organic Monolayers for Area Selective Deposition”
Matthias Young (University of Missouri, USA), “From the Noise: Measuring Atomic Structure in Amorphous Thin Films Grown by Atomic Layer Deposition”

ALE Invited Speakers

Sumiko Fujisaki (Hitachi Ltd., Research & Development Group, Japan), “Thermal ALE of Co by Organometallic Complexes”
Akiko Hirata (Sony Semiconductor Solutions Corp., Japan), “Highly Selective Atomic Layer Etching for Semiconductor Application”
Anil Mane (Argonne National Lab, USA), “Novel Chemistries for Layer-by-Layer Etching of 2D Semiconductor Coatings and Organic-Inorganic Hybrid Materials”
Gottlieb Oehrlein (University of Maryland, USA), “Achieving Selective Material Removal in Plasma-Based Atomic Layer Etching (ALE) of SiO2”
Simon Ruel (CEA-LETI, France), “GaN Damage Evaluation After Conventional Plasma Etching and Anisotropic Atomic Layer Etching”
Andrew Teplyakov (University of Delaware, USA), “Mechanistic Insights into Thermal Dry Atomic Layer Processing of Metals”
Noriaki Toyoda (University of Hyogo, Japan), “Surface Reactions Between Metals and Diketone induced by Gas Cluster Ion Bombardments”
Dennis van Dorp (imec, Belgium), “Atomic Scale Etching of Semiconductors; Digital Versus Non-Digital Approaches”
Geun Young Yeom (Sungkyunkwan University, South Korea), “Precise Atomic Layer Control of 2D MoS2 by ALE Technique for Device Applications”