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Awards

ALD 2020 Innovator Awardee

Mikko Ritala, ALD 2020 Innovator Awardee

The ALD Innovator award “For Original Work and Leadership in ALD” will be presented during the live virtual session on Monday.

Mikko Ritala
University of Helsinki, Finland

Biography: Mikko Ritala (born 1968 in Nokia, Finland) is a professor of inorganic materials chemistry at University of Helsinki. He received his M.Sc. degree in 1991 from University of Turku, and Ph.D. degree in 1994 from University of Helsinki, both in inorganic chemistry. During 1995 – 2003 he worked at University of Helsinki, first as a postdoctoral researcher and then as an academy research fellow, both posts granted by Academy of Finland. In 2003 he was nominated to his current position.

After starting in 1991, Mikko Ritala has spent nearly 30 years in ALD research. His main research topic in ALD is development of new processes and precursors for thin films for microelectronics and other applications. Real time reaction mechanism studies form an important part of this research. Another research area is preparation of nanostructured materials by for example templating with ALD and electrodeposition, and electrospinning and electroblowing of nanofibres. Mikko Ritala has supervised 30 PhDs, published 500 papers (h-index = 70) and holds several key patents. In 2007 he was nominated as ISI Highly Cited Author in the field of materials science, and in 2010 he received Alfred Kordelin Foundation award. He has given numerous invited talks in international conferences. He started the American Vacuum Society’s short course on Atomic Layer Deposition and has given tutorials on the same topic also in other occasions. Mikko Ritala has participated in organization of numerous international conferences, including the AVS ALD conference series from its very beginning. He chaired the ALD 2004 meeting in Helsinki that combined the AVS-ALD and Baltic ALD (BALD) conferences, and he is prepared to repeat the same in 2024.

ALD Student Awards

ALD Student Finalists and ALD Best Student Paper Awards

ALD student awards have been established to recognize outstanding research performed by a graduate student in areas of interest to Atomic Layer Deposition. All Student Awards will be presented during the live virtual session on Wednesday.

ALD Student Finalists have been chosen from the submitted student abstracts (all student abstracts were eligible). ALD Student Finalists will receive a $500 award upon completing the competition. Competition for the award requires an oral presentation during the ALD 2020 Virtual Meeting.

  • “Deposition of Conductive PEDOT Thin Films with EDOT and ReCl5 Precursors,” Saba Ghafourisaleh‚ Georgi Popov‚ Markku Leskelä‚ Matti Putkonen‚ Mikko Ritala (University of Helsinki‚ Finland)
  • “Resistless Lithography Based on Local Surface Modification of Halogenated Amorphous Carbon,” Mikhail Krishtab (KU Leuven/Imec‚ Belgium); Tero Kulmala‚ Emine Cagin (Heidelberg Instruments Nano‚ Switzerland); Silvia Armini (Imec‚ Belgium); Stefan De Gendt (KU Leuven/Imec‚ Belgium); Rob Ameloot (KU Leuven‚ Belgium)
  • “Mimicking Chitin and Chitosan Type of Functionality with Novel Thin Films Grown by Molecular Layer Deposition,” Karina Ashurbekova‚ Mato Knez (CIC nanoGUNE BRTA‚ Spain)

The ALD Best Student Paper Award winner will be selected on the basis of the oral presentation, considering quality of research and clarity of presentation. The award consists of a $1,000 cash prize and a certificate.

  • ALD 2020 Best Student Paper Awardee: “Mixing It Up: Tuning Atomic Ordering in 2-D Mo1-xWxS2 Alloys,” Jeff Schulpen‚ Erwin Kessels‚ Vincent Vandalon‚ Ageeth Bol (Eindhoven University of Technology‚ Netherlands)
JVST A Best ALD Paper Award

Journal of Vacuum Science & Technology A (JVST A) has been publishing articles originating from the ALD Conference since 2010 as a Special Collection and will continue to do so each year. A JVST A Best ALD Paper Award has been established to recognize an outstanding article contributed to the JVST A ALD Special Collection. Each year JVST A Editors will select the winning paper from the articles published in the most recent ALD Special Collection. Eligible papers will include at least one author who participated in the ALD Conference. Authors on the winning paper will share a $1,000 cash award and each of them will be presented with a certificate acknowledging their exceptional accomplishment. The winning paper will be made freely available for a period of two years and widely promoted via email and on social and professional networks. JVST A does not have page or publication charges and is the flagship journal of AVS, a nonprofit professional society.

JVST A 2019 Best ALD Paper Awardee
  • “Correlation Between SiO2 Growth Rate and Difference in Electronegativity of Metal–Oxide Underlayers for Plasma Enhanced Atomic Layer Deposition Using Tris(dimethylamino)silane Precursor,” Erika Maeda, Toshihide Nabatame, Masafumi Hirose, Mari Inoue, Akihiko Ohi, Naoki Ikeda, and Hajime Kiyono | JVST A 38, 032409 (2020)

ALE Student Awards

ALE student awards have been established to recognize outstanding research performed by a graduate student in areas of interest to Atomic Layer Etching. All Student Awards will be presented during the live virtual session on Wednesday.

The ALE Student Finalists have be chosen from the submitted student abstracts (all student abstracts were eligible). ALE Student Finalists will receive a $500 award upon completing the competition.

  • “Cryo-ALE of SiO2 with C4F8 Physisorption: Process Understanding and Enhancement,” Gaëlle Antoun (GREMI Université d’Orléans/CNRS, France)
  • “Thermal Atomic Layer Etching of Nickel Using SO2Cl2and P(CH3)3,”Jessica Murdzek (University of Colorado – Boulder)
  • “Thermal-Plasma ALE on Selected Metals for EUV and Integration Processes,”Xia (Gary) Sang, University of California Los Angeles
  • “Blocking Thermal Atomic Layer Etching with Removable Etch Stop Layers,”David Zywotko (University of Colorado – Boulder)

The ALE Best Student Paper Award winner will be selected on the basis of the oral presentation, considering quality of research and clarity of presentation. The award consists of a $1,000 cash prize and a certificate.

  • ALE 2020 Best Student Paper Awardee: “Isotropic Plasma ALE of Al2O3 Using SF6 Plasma and TMA,” Nicholas Chittock (Eindhoven University of Technology, Netherlands)

ALD Innovator Awardees

  • 2011: Roy Gordon
  • 2012: Markku Leskela
  • 2013: Steve George
  • 2014: Hyeongtag Jeon
  • 2015: Gregory Parsons
  • 2016: Suvi Haukka
  • 2017: Jeff Elam
  • 2018: Hyungjun Kim
  • 2019: W.M.M. (Erwin) Kessels
  • 2020: Mikko Ritala

Other ALD Awards News

  • Tuomo Suntola, The international Millennium Technology Prize, 2018
  • Steven George (University of Colorado, Boulder), AVS John A. Thornton Memorial Award and Lecture, 2017
  • Hele Savin (Aalto University), Finnish Innovation Award for Women, 2017
  • Markku Leskelä (University of Helsinki), A. I. Virtanen -palkinto, 2011,
  • Tuomo Suntola, European SEMI award 2004,
  • Tuomo Suntola, The Finnish Engineering Achievement Award, 1985
  • Tuomo Suntola, Honorary Award for The Development of Manufacturing Technology for Electroluminescent Display Devices, The Foundation of Technology in Finland, 1981
  • Tuomo Suntola, Jorma Antson, Arto Pakkala, Sven Lindfors, Outstanding Paper Award for Atomic Layer Epitaxy for Producing EL Thin Films, The Society for Information Displays (SID), USA, 1980.
  • Tuomo Suntola, Award for Electroluminescent Display Technology, The Association of Finnish Electric and Electronics Industries, SETELI, 1980.

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Key Dates

Abstract Submission Deadline:
February 3, 2020

Author Acceptance Notifications:
March 16, 2020

Late News Abstract Deadline:
April 6, 2020

Pre-Registration Deadline:
June 25, 2020

Manuscript Deadline:
October 14, 2020

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